Anodic-oxide-induced interdiffusion in GaAs/AlGaAs quantum wells
نویسندگان
چکیده
منابع مشابه
MOS gated Si:SiGe quantum wells formed by anodic oxidation
We have used electrochemical anodic oxidation to form gate oxides on strained n-channel Si:SiGe quantum wells. The oxides are characterized by current–voltage and capacitance–voltage measurements. Comparison of measured and calculated electron sheet densities in the quantum well, indicates that the oxide growth does not cause degradation of the Si:SiGe material. This is confirmed by low-tempera...
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 1998
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.366830